Applied Math and Science Education Repository - 193nm Immersion Lithography: Status and Challenges

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Title:

193nm Immersion Lithography: Status and Challenges

Url:

https://spie.org/news/immersionlitho-intro?SSO=1

Creator:

Back, David
Wei, Yayi

Publisher:

Society of Photographic Instrumentation Engineers

Description: This article is a comprehensive review of 193nm immersion lithography. It focuses on the materials and processes rather than the optical system of the tool. The article covers the history and current status of the technology.

LC Classification:

Bibliography. Library science. Information resources (General) -- Book industries and trade -- Printing -- Practical printing -- Other processes, A-Z -- Lithography
Science -- Physics -- Optics. Light

GEM Subject:

Science -- Engineering
Science -- Technology
Science -- Physics

Key Concept:

Physics
Physics -- Waves

Date Issued:

2007-03-22

Resource Type:

Reference Material
Instructional Material

Format:

Document -- HTML

Audience:

Educator
Professional/Practitioner

Education Level:

Higher Education
Higher Education -- Graduate/Professional
Higher Education -- Undergraduate (Lower Division)
Higher Education -- Undergraduate (Upper Division)
Higher Education -- Technical Education (Upper Division)
Higher Education -- Technical Education (Lower Division)
Vocational/Professional Development Education

Language:

English

Rights:

SPIE

Access Rights:

Free access

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Source Type:

ATE Center

Source:

NetWorks

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